fotorezist

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Turkish - English
(Nükleer Bilimler) photoresist
A light-sensitive film used in photolithography and photoengraving
a substance that can be made to form a tough film by a photographic process, used to mask electrical circuits before chemical etching
Light-sensitive material that is used to form selectively protective masking layers during wafer processing A photo-mask is used to define the areas of photoresist exposed to light, which are subsequently removed by a solvent, leaving the required pattern on the wafer surface The entire process is called photolithography
Typically, a liquid polymeric material that is patterned during a photolithographic process The material is then imaged using a series of exposure, developing, and baking steps
A light-sensitive chemical used to coat the wafer When developed and removed by processes similar to those used in photography, the exposed photoresist adheres strongly to the chip and the unexposed portion is etched away, forming a circuit pattern
{i} photosensitive liquid polymer which becomes insoluble after exposure to light (used to print patterns onto integrated circuits prior to chemical etching)
Layer, laminated onto the surface of a PCB, as part of a photo-printing process
A photomechanical product, in the form of a liquid or a laminated dry film, used in the manufacture of printed circuits Certain types require the use of large quantities of ozone-depleting hydrochlorocarbon solvents, mostly 1,1,1-trichloroethane and methylene chloride, for their processing