The photographic process used to transfer circuit patterns onto a semiconductor wafer This is done by projecting light through a patterned reticle, onto a silicon wafer covered with a photosensitive material (photoresist) A reticle is a glass plate with a layer of chrome on one side back to top
Carving through the use of light Typically, a photosensitive surface (a photoresist) is selectively exposed to light using a template The exposed areas are subsequently etched (chemically carved)
In MEMS fabrication, the process used to transfer an image to a semiconductor wafer or other substrate Typical steps include photoresist coating, exposure, photoresist development, and baking
The process used to make computer chips today Photolithography uses a beam of light to etch the geometric patterns that will become circuits onto a chip The circuit pattern is used on a master called a mask, and is then transferred to the chips during the production process Here's where nanoelectronics comes in: Many experts think photolithography will be unable to keep up with the ever-decreasing dimensions of chip features It's possible that an alternative to photolithography will be based on nanotechnology Three competing technologies, X-ray lithograpy; e-beam lithography; nano-imprint lithography will allow the creation of patterns down to 100 nm